Full-cycle MEMS development, on our own equipment
VastVision combines on-site lithography, etch, and electrodeposition with partner access to national-laboratory-grade nanofabrication. That lets us take a device from design through characterized hardware, whether it is a thin-film sensor, an RF structure, or a custom MEMS component.
In-House Cleanroom & Lithography
Our cleanroom and microfabrication lab are equipped for full-cycle device development.
- Class 5 cleanroom supporting lithography and device fabrication
- UV lithography for micro-scale patterning
- Plasma etching for surface treatment and pattern transfer
- Electroplating and electrodeposition process line
MEMS Device Fabrication
A complete pattern, deposit, etch, and release workflow for sensors and structures.
- Full pattern, deposit, etch, and release workflow
- Thin-film sensor development
- RF antenna and structure fabrication
- Small-batch prototype runs with process documentation
Partner-Accessed Nanofabrication
Beyond our in-house tools, user agreements extend our reach to national-laboratory instrumentation.
- Electron-beam lithography: Raith Voyager, Raith Pioneer Two, JEOL JBX-8100FS
- Class-100 photolithography via UNM and Sandia/CINT
- Prototype fabrication: design, fab, and characterize
- Fee-for-service fabrication, tool time, and SBIR/STTR (NAICS 541715)